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Tytuł:
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76-1: Invited Paper: Optimization of Applied Materials PiVot Array Coater for Metal Oxide Semiconductor Layers.
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Autorzy:
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Park, Hyun Chan
Kloeppel, Andreas
Bhoolokam, Ajay Sampath
Hanika, Markus
Bender, Marcus
Busch, John D
Hsu, Hao-Chien
Yim, Dong Kil
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Temat:
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METAL oxide semiconductors
PHYSICAL vapor deposition
THIN film transistors
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Źródło:
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SID Symposium Digest of Technical Papers; May2017, Vol. 48 Issue 1, p1108-1111, 4p
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Applied Materials' static PVD array coater using rotary targets has been developed to provide less in-film particle, high target utilization performance by novel rotary target technology and uniform layer deposition by unique magnet motion in display industry. It has been optimized to provide highly stable and uniform thin metal oxide layer to reach uniform TFT performance for large area substrate (2500x2200mm glass size). [ABSTRACT FROM AUTHOR]
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