Informacja

Drogi użytkowniku, aplikacja do prawidłowego działania wymaga obsługi JavaScript. Proszę włącz obsługę JavaScript w Twojej przeglądarce.

Przeglądasz jako GOŚĆ
Tytuł pozycji:

A systematic comparison of polar and semipolar Si-doped AlGaN alloys with high AlN content.

Tytuł :
A systematic comparison of polar and semipolar Si-doped AlGaN alloys with high AlN content.
Autorzy :
Spasevski, Lucia
Kusch, Gunnar
Pampili, Pietro
Zubialevich, Vitaly Z
Dinh, Duc V
Bruckbauer, Jochen
Edwards, Paul R
Parbrook, Peter J
Martin, Robert W
Pokaż więcej
Temat :
N-type semiconductors
LIGHT emitting diodes
GALLIUM alloys
CHEMICAL vapor deposition
ATOMIC force microscopy
ALLOYS
CRYSTAL orientation
Źródło :
Journal of Physics: D Applied Physics; 1/21/2021, Vol. 54 Issue 3, p1-12, 12p
Czasopismo naukowe
With a view to supporting the development of ultra-violet light-emitting diodes and related devices, the compositional, emission and morphology properties of Si-doped n-type AlxGa1-xN alloys are extensively compared. This study has been designed to determine how the different AlxGa1-xN crystal orientations (polar (0001) and semipolar (11–22)) affect group-III composition and Si incorporation. Wavelength dispersive x-ray (WDX) spectroscopy was used to determine the AlN mole fraction (x ≈ 0.57–0.85) and dopant concentration (3 × 1018–1 × 1019 cm−3) in various series of AlxGa1-xN layers grown on (0001) and (11–22) AlN/sapphire templates by metalorganic chemical vapor deposition. The polar samples exhibit hexagonal surface features with Ga-rich boundaries confirmed by WDX mapping. Surface morphology was examined by atomic force microscopy for samples grown with different disilane flow rates and the semipolar samples were shown to have smoother surfaces than their polar counterparts, with an approximate 15% reduction in roughness. Optical characterization using cathodoluminescence (CL) spectroscopy allowed analysis of near-band edge emission in the range 4.0–5.4 eV as well as various deep impurity transition peaks in the range 2.7–4.8 eV. The combination of spatially-resolved characterization techniques, including CL and WDX, has provided detailed information on how the crystal growth direction affects the alloy and dopant concentrations. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Physics: D Applied Physics is the property of IOP Publishing and its content may not be copied or emailed to multiple sites or posted to a listserv without the copyright holder's express written permission. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)

Ta witryna wykorzystuje pliki cookies do przechowywania informacji na Twoim komputerze. Pliki cookies stosujemy w celu świadczenia usług na najwyższym poziomie, w tym w sposób dostosowany do indywidualnych potrzeb. Korzystanie z witryny bez zmiany ustawień dotyczących cookies oznacza, że będą one zamieszczane w Twoim komputerze. W każdym momencie możesz dokonać zmiany ustawień dotyczących cookies