- Tytuł:
- Channeling and High-Resolution Backscattering Studies of Laser-Annealed Low-Energy Arsenic-Implanted Silicon
- Autorzy:
- Źródło:
- Ion Implantation: Equipment and Techniques : Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982. 11:549-553
- Degree:
- Ph.D.
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