- Tytuł:
- The Effect of the Method by Which a High-Resistivity GaN Buffer Layer Is Formed on Properties of InAlN/GaN and AlGaN/GaN Heterostructures with 2D Electron Gas.
- Autorzy:
- Temat:
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GALLIUM nitride
METAL organic chemical vapor depositionELECTRIC conductivity
CRYSTAL growth
EPITAXIAL layers - Źródło:
- Technical Physics Letters; Jul2018, Vol. 44 Issue 7, p577-580, 4p
Czasopismo naukowe