- Tytuł:
-
Effect of Process Temperature and Reaction Cycle Number on Atomic Layer Deposition of TiO
2 Thin Films Using TiCl4 and H2 O Precursors: Correlation Between Material Properties and Process Environment - Autorzy:
- Źródło:
- Brazilian Journal of Physics. February 2016 46(1):56-69
Czasopismo naukowe