- Tytuł:
- High‐Temperature Annealing of Si‐Doped AlGaN.
- Autorzy:
- Temat:
-
DEPTH profiling
SECONDARY ion mass spectrometry
EPITAXY
DISLOCATION density
BUFFER layers
MOLE fraction
CHEMICAL templates - Źródło:
- Physica Status Solidi. A: Applications & Materials Science; Apr2024, Vol. 221 Issue 7, p1-9, 9p
Czasopismo naukowe