- Tytuł:
- Pushing feature size down to 11 nm by hyperbolic metamaterials-based interference photolithography under illumination of UV light source.
- Autorzy:
- Źródło:
- Applied Physics A: Materials Science & Processing. Feb2023, Vol. 129 Issue 2, p1-7. 7p. 1 Diagram, 6 Graphs.
Czasopismo naukowe