- Tytuł:
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Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y
2 O3 –Y4 Al2 O9 composite under CF4 /Ar/O2 mixed gas conditions. - Autorzy:
- Źródło:
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Scientific Reports . 3/25/2024, Vol. 14 Issue 1, p1-12. 12p.
Czasopismo naukowe