Impact of electrical stress on the electrical characteristics of 2 MeV electron irradiated metal-oxide-silicon capacitors with atomic layer deposited Al2O3, HfO2 and nanolaminated dielectrics
In European Symposium on Reliability of Electron Devices, Failure Physics and Analysis, Microelectronics Reliability September-November 2013 53(9-11):1333-1337
2 MeV electron irradiation effects on the electrical characteristics of metal–oxide–silicon capacitors with atomic layer deposited Al2O3, HfO2 and nanolaminated dielectrics
In Proceedings of the EMRS 2009 Spring Meeting Symposium I: Silicon and germanium issues for future CMOS devices, Thin Solid Films 2010 518(9):2513-2516
In Proceedings of the EMRS 2009 Spring Meeting Symposium I: Silicon and germanium issues for future CMOS devices, Thin Solid Films 2010 518(9):2517-2520
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