- Tytuł:
-
Influence of Carrier Gases on the Quality of Epitaxial Corundum-Structured α-Ga2O3 Films Grown by
Mist Chemical Vapor Deposition Method - Autorzy:
- Temat:
-
wide-bandgap semiconductor
α-ga2o3mist chemical vapor deposition (mist -cvd )
carrier gas
transparent semiconductor
Technology
Electrical engineering. Electronics. Nuclear engineering
TK1-9971
Engineering (General). Civil engineering (General)
TA1-2040
Microscopy
QH201-278.5
Descriptive and experimental mechanics
QC120-168.85 - Źródło:
- Materials, Vol 12, Iss 22, p 3670 (2019)
- Opis pliku:
- electronic resource
- Relacje:
- https://www.mdpi.com/1996-1944/12/22/3670; https://doaj.org/toc/1996-1944
- Dostęp URL:
- https://doaj.org/article/32c906f9c6994301bb5c24609ed491e1  Link otwiera się w nowym oknie
Czasopismo naukowe